Origin of Rh and Pd agglomeration on the CeO2(111) surface

被引：21
|
作者：
Li, Baihai [1 ,2 ]
Ezekoye, Obiefune K. [2 ]
Zhang, Qiuju [1 ]
Chen, Liang [1 ]
Cui, Ping [1 ]
Graham, George [2 ]
Pan, Xiaoqing [2 ]
机构：
[1] Chinese Acad Sci, Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
[2] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
来源：
PHYSICAL REVIEW B | 2010年 / 82卷 / 12期
基金：
美国国家科学基金会;
关键词：
OXYGEN VACANCIES; ELECTRONIC-STRUCTURE; SUPPORTED PD; CERIA; CATALYSTS; METAL; CLUSTERS; OXIDATION; PLATINUM; BEHAVIOR;
D O I：
10.1103/PhysRevB.82.125422
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Our theoretical study presents an insight to rationalize the growth behavior of Pd and Rh particles on the CeO2(111) surface under sequential oxidative and reductive treatments. The oxidation state of Rh atoms plays an important role in the interfacial morphology. Under oxidative conditions, the strong O-Rh-O sandwiched structure inhibits Rh agglomeration. However, the removal of surface oxygen atoms in Rh oxide under reductive conditions facilitates the cleavage of Rh-CeO2 bonding and consequently results in the agglomeration of metallic Rh. Experimental transmission electron microscopy observations are consistent with the theoretical calculations.
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页数：7
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