Nanoscale patterns produced by self-sputtering of solid surfaces: The effect of ion implantation

被引：30

作者：

Bradley, R. Mark ^{[1
]}

Hofsaess, Hans ^{[2
]}

机构：

[1] Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USA

[2] Univ Gottingen, Inst Phys 2, Friedrich Hund Pl 1, D-37077 Gottingen, Germany

来源：

JOURNAL OF APPLIED PHYSICS | 2016年 / 120卷 / 07期

基金：

美国国家科学基金会;

关键词：

BEAM EROSION; REDEPOSITION; BOMBARDMENT;

D O I：

10.1063/1.4960807

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A theory of the effect that ion implantation has on the patterns produced by ion bombardment of solid surfaces is introduced. For simplicity, the case of self-sputtering of an elemental material is studied. We find that implantation of self-ions has a destabilizing effect along the projected beam direction for angles of incidence h that exceed a critical value. In the transverse direction, ion implantation has a stabilizing influence for all h. Published by AIP Publishing.

引用

页数：8

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