Mixed cation phases in sputter deposited HfO2-TiO2 nanolaminates

被引：16
|
作者：
Cisneros-Morales, M. C. [1 ,2 ]
Aita, C. R. [1 ,2 ]
机构：
[1] Univ Wisconsin, Coll Engn & Appl Sci, Adv Coatings Expt Lab, Dept Mat, Milwaukee, WI 53201 USA
[2] Univ Wisconsin, Coll Engn & Appl Sci, Adv Coatings Expt Lab, Surface Studies Lab, Milwaukee, WI 53201 USA
来源：
APPLIED PHYSICS LETTERS | 2008年 / 93卷 / 02期
关键词：
D O I：
10.1063/1.2957670
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Nanolaminate HfO2-TiO2 films are grown by reactive sputter deposition on unheated fused SiO2, sequentially annealed at 573 to 973 K, and studied by x-ray diffraction. A nanocrystalline structure of orthorhombic (o) HfTiO4 adjacent to an interface followed by monoclinic (m) Hf1-xTixO2 is identified. m-Hf1-xTixO2, a metastable phase, is isomorphous with m-HfO2 and a high pressure phase, m-HfTiO4. A Vegard's law analysis shows that the Ti atomic fraction in m-Hf1-xTixO2 is much greater than Ti equilibrium solubility in m-HfO2. A space group-subgroup argument proposes that m-Hf1-xTixO2 arises from an o/m-HfTiO4 second order phase transition to accommodate the larger Hf atom. (C) 2008 American Institute of Physics.
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