EUV local CDU healing performance and modeling capability towards 5nm node

被引：0
|
作者：
Jee, Tae Kwon [1 ]
Timoshkov, Vadim [1 ,2 ]
Choi, Peter [2 ]
Rio, David [2 ]
Tsai, Yu-Cheng [2 ]
Yaegashi, Hidetami [3 ]
Koike, Kyohei [3 ]
Fonseca, Carlos [4 ]
Schoofs, Stijn [5 ]
机构：
[1] ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands
[2] ASML US, 399 W Trimble Rd, San Jose, CA 95131 USA
[3] Tokyo Electron Ltd, Minato Ku, Akasaka Biz Tower,3-1 Akasaka 5 Chome, Tokyo 1076325, Japan
[4] Tokyo Electron US, 2400 Grove Blvd, Austin, TX 78741 USA
[5] IMEC, Kapeldreef 75, B-3001 Heverlee, Belgium
来源：
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2017 | 2017年 / 10450卷
关键词：
5nm node; contact hole; CD healing; local CDU; after-etch model; OPC errors; EPE;
D O I：
10.1117/12.2281627
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Both local variability and optical proximity correction (OPC) errors are big contributors to the edge placement error (EPE) budget which is closely related to the device yield. The post-litho contact hole healing will be demonstrated to meet after-etch local variability specifications using a low dose, 30mJ/cm(2) dose-to-size, positive tone developed (PTD) resist with relevant throughput in high volume manufacturing (HVM). The total local variability of the node 5nm (N5) contact holes will be characterized in terms of local CD uniformity (LCDU), local placement error (LPE), and contact edge roughness (CER) using a statistical methodology. The CD healing process has complex etch proximity effects, so the OPC prediction accuracy is challenging to meet EPE requirements for the N5. Thus, the prediction accuracy of an after-etch model will be investigated and discussed using ASML Tachyon OPC model.
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页数：9
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