Temperature characterization of Raman scattering in an AlGaN/GaN heterostructure

被引:8
作者
Chen, DJ
Shen, B [1 ]
Wu, XL
Shen, JC
Xu, FJ
Zhang, KX
Zhang, R
Jiang, RL
Shi, Y
Zheng, YD
机构
[1] Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China
[2] Nanjing Univ, Dept Phys, Nanjing 210093, Peoples R China
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2005年 / 80卷 / 08期
关键词
D O I
10.1007/s00339-003-2456-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Raman scattering from an AlGaN/GaN heterostructure was performed in the temperature range from 77 to 773 K. The first- and second-order Raman scattering of the A(1) longitudinal-optical phonon-plasmon coupled mode from an AlGaN/GaN interface as well as the Raman scattering from the GaN layer were observed. All the modes downshift, and their intensities weaken with increasing temperature. The free-carrier concentration estimated by the frequency of the coupled mode from an AlGaN/GaN interface is 7.5 times as high as that of n-AlGaN, indicating mass free-carrier transfer from the AlGaN barrier to the GaN well. Moreover, the temperature dependence of the phonon frequency is well described by an empirical formula.
引用
收藏
页码:1729 / 1731
页数:3
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