Atomistic modeling of Ag deposition on the low-index faces of Al and Al deposition on Ag

被引:8
作者
Bozzolo, G
Garcés, JE
Smith, RJ
机构
[1] NASA, Glenn Res Ctr, Cleveland, OH 44135 USA
[2] Ohio Aerosp Inst, Cleveland, OH 44142 USA
[3] Comis Nacl Energia Atom, Ctr Atom Bariloche, RA-8400 San Carlos De Bariloche, Rio Negro, Argentina
[4] Montana State Univ, Dept Phys, Bozeman, MT 59717 USA
基金
美国国家科学基金会;
关键词
adatoms; computer simulations; silver; aluminum; semi-empirical methods and model calculations; surface alloys; surface structure;
D O I
10.1016/j.susc.2005.03.042
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The deposition of Ag on low-index surfaces of Al, and the symmetric case of Al on Ag surfaces, are studied by means of a simple modeling approach based on a quantum approximate technique, the BFS method for alloys. For submonolayer deposits of Ag on Al, a preference is seen for growth of close-packed chains along nearest-neighbor directions on (100) and (110) surfaces, while cluster formation is preferred for growth on Al(111). For Al deposition on all three low-index Ag surfaces, diffusion of Al into the Ag surface layers is favored. The behavior seen on the various surfaces is attributed to a competition between the preference for Ag atoms to favor an Al environment, while Al atoms tend to avoid the increased energy associated with having Ag neighbors. The energies of the various atomic configurations are then determined by how the two competing effects manifest themselves for the corresponding geometric arrangements considered. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:229 / 252
页数:24
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