Gas-phase chemistry and reactive-ion etching kinetics for silicon-based materials in C4F8 + O2 + Ar plasma (vol 18, e2000249, 2021)

被引：0
|
作者：
Lee, Byung J. [1 ]
Efremov, Alexander [2 ]
Kwon, Kwang-Ho [1 ]
机构：
[1] Korea Univ, Dept Control & Instrumentat Engn, Sejong 30019, South Korea
[2] State Univ Chem Technol, Dept Elect Devices & Mat Technol, Ivanovo, Russia
来源：
PLASMA PROCESSES AND POLYMERS | 2021年
关键词：
D O I：
10.1002/ppap.20207024
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页数：2
相关论文
共 36 条
  • [31] Time-varying mechanism of ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma
    Kuboi, Shuichi
    Kato, Haruhito
    Akatsuka, Yudai
    Suzuki, Haruka
    Toyoda, Hirotaka
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2024, 63 (01)
  • [32] Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase during hollow cathode reactive ion etching plasma
    Tezani, L. L.
    Pessoa, R. S.
    Maciel, H. S.
    Petraconi, G.
    VACUUM, 2014, 106 : 64 - 68
  • [33] Measurement of F-, O- and CF3- densities in 60 and 100 MHz asymmetric capacitively coupled plasma discharge produced in an Ar/O2/C4F8 gas mixture
    Sirse, N.
    Tsutsumi, T.
    Sekine, M.
    Hori, M.
    Ellingboe, A. R.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2017, 50 (33)
  • [34] Mass spectroscopic measurement of time-varying ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma
    Kuboi, Shuichi
    Kato, Haruhito
    Seki, Yuto
    Suzuki, Haruka
    Toyoda, Hirotaka
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2023, 62 (SI)
  • [35] Characteristics of SiO2 Etching with a C4F8/Ar/CHF3/O2 Gas Mixture in 60-MHz/2-MHz Dual-frequency Capacitively Coupled Plasmas
    Jeon, M. H.
    Kang, S-K.
    Park, J. Y.
    Yeom, G. Y.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2011, 59 (05) : 3024 - 3030
  • [36] Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process
    Sahu, Bibhuti Bhusan
    Nakane, Kazuya
    Ishikawa, Kenji
    Sekine, Makoto
    Tsutsumi, Takayoshi
    Gohira, Taku
    Ohya, Yoshinobu
    Ohno, Noriyasu
    Hori, Masaru
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2022, 24 (22) : 13883 - 13896
1234