Three carbon pairs in Si

被引:10
作者
Docaj, A. [1 ]
Estreicher, S. K. [1 ]
机构
[1] Texas Tech Univ, Dept Phys, Lubbock, TX 79409 USA
关键词
Silicon; Theory; Carbon pairs; LOCAL VIBRATIONAL-MODES; MINIMUM ENERGY PATHS; ELASTIC BAND METHOD; INTERSTITIAL-CARBON; SUBSTITUTIONAL-CARBON; SADDLE-POINTS; SILICON; DEFECTS; SYSTEMS; PSEUDOPOTENTIALS;
D O I
10.1016/j.physb.2011.08.029
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Carbon impurities in Si are common in floating-zone and cast-Si materials. The simplest and most discussed carbon complex is the interstitial-substitutional CiCs pair, which readily forms when self-interstitials are present in the material. This pair has three possible configurations, each of which is electrically active. The less common CsCs pair has been studied in irradiated material but has also recently been seen in as-grown C-rich cast-Si, which is commonly used to fabricate solar cells. The third pair consists of two interstitial C atoms: CiCi. Although its formation probability is low for several reasons, the CiCi pair is very stable and electrically inactive. In this contribution, we report preliminary results of first-principles calculations of these three C pairs in Si. The structures, binding energies, vibrational spectra, and electrical activity are predicted. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:2981 / 2984
页数:4
相关论文
共 34 条
[1]  
[Anonymous], RAD DAMAGE SEMICONDU
[2]  
Artacho E, 1999, PHYS STATUS SOLIDI B, V215, P809, DOI 10.1002/(SICI)1521-3951(199909)215:1<809::AID-PSSB809>3.0.CO
[3]  
2-0
[4]  
Bean A. R., 1970, Solid State Communications, V8, P175, DOI 10.1016/0038-1098(70)90074-8
[5]   Dimer of substitutional carbon in silicon studied by EPR and ab initio methods [J].
Byberg, JR ;
Nielsen, BB ;
Fanciulli, M ;
Estreicher, SK ;
Fedders, PA .
PHYSICAL REVIEW B, 2000, 61 (19) :12939-12945
[6]   Theory of carbon-carbon pairs in silicon. [J].
Capaz, RB ;
Dal Pino, A ;
Joannopoulos, JD .
PHYSICAL REVIEW B, 1998, 58 (15) :9845-9850
[7]   IDENTIFICATION OF THE MIGRATION PATH OF INTERSTITIAL CARBON IN SILICON [J].
CAPAZ, RB ;
DALPINO, A ;
JOANNOPOULOS, JD .
PHYSICAL REVIEW B, 1994, 50 (11) :7439-7442
[8]   GROUND-STATE OF THE ELECTRON-GAS BY A STOCHASTIC METHOD [J].
CEPERLEY, DM ;
ALDER, BJ .
PHYSICAL REVIEW LETTERS, 1980, 45 (07) :566-569
[9]  
Davies G., 1994, Handbook on Semiconductors, VVol. 3, pp. 1557, DOI DOI 10.1002/CVDE.19960020108
[10]   Activation Energies for Diffusion of Defects in Silicon: The Role of the Exchange-Correlation Functional [J].
Estreicher, Stefan K. ;
Backlund, Daniel J. ;
Carbogno, Christian ;
Scheffler, Matthias .
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2011, 50 (43) :10221-10225