Preparation and character of textured ZnO:Al thin films deposited on flexible substrates by RF magnetron sputtering

被引：19

作者：

Wang, Xiao-jing ^{[1
,2
]}

Wang, Hang ^{[1
]}

Zhou, Wen-li ^{[1
,2
]}

Li, Gang-xian ^{[1
,2
]}

Yu, Jun ^{[1
,2
]}

机构：

[1] Huazhong Univ Sci & Technol, Dept Elect Sci & Technol, Wuhan 430074, Peoples R China

[2] Hubei PV Ctr Engn & Technol, Wuhan 430074, Peoples R China

来源：

MATERIALS LETTERS | 2011年 / 65卷 / 13期

基金：

中国国家自然科学基金;

关键词：

Textured Al-doped ZnO (ZnO:Al); Flexible substrate; Acetic acid solution; Solar energy materials; Thin films; Deposition; LIGHT-SCATTERING; AL FILMS;

D O I：

10.1016/j.matlet.2011.01.019

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

ZnO:Al thin films deposited on transparent TPT substrates by magnetron sputtering were etched in acetic acid solution. The effects of etching solution concentration and etching time on the structure and properties of ZnO:Al films were investigated. The obtained films had a hexagonal structure and a highly preferred orientation with the c-axis perpendicular to the substrate. The ZAO film etched in 1% acetic acid solution for 10 s had a pyramidal structure and an enhanced light scattering ability, the average transmittance and reflectance in the visible region were 72% and 26% respectively, the sheet resistance was 260 Omega/square. Both transmittance and reflectance of the films decreased as the etching solution concentration and etching time increasing. Etching had a negative effect on the conductive properties of ZAO films. The lowest sheet resistance was 120 Omega/square for the ZAO film without etching. (C) 2011 Published by Elsevier B.V.

引用

页码：2039 / 2042

页数：4

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