Transcriptional ablation using femtosecond laser with mask

被引：0

作者：

Nakata, Y ^{[1
]}

Okada, T ^{[1
]}

Maeda, M ^{[1
]}

机构：

[1] Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Dept Elect & Elect Syst Engn, Higashi Ku, Fukuoka 8128581, Japan

来源：

FOURTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2003年 / 5063卷

关键词：

femtosecond laser; laser ablation; lithography; thin film; interference; transcription of mask;

D O I：

10.1117/12.540518

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Mask patterns in the shape of lines were transferred on gold thin films by laser ablation using femtosecond laser and a photo-lithographic optical system. A laser beam passed through a mask and the pattern was imaged on the film by a pair of convex lenses. As a result, the film was lithographically ablated, and microsized patterns were generated in a single shot Fringes were generated outside the ablated patterns with defocusing or larger laser fluence. The resolution of generation was 13 mum, and the narrowest width of a generated line was about 4 mum actually.

引用

页码：358 / 361

页数：4

共 8 条

[1] Encoding of holographic grating and periodic nano-structure by femtosecond laser pulse [J].