Laser-produced plasma source development for EUV lithography

被引：10

作者：

Endo, Akira ^{[1
]}

Komori, Hiroshi ^{[1
]}

Ueno, Yoshifumi ^{[1
]}

Nowak, Krzysztof M. ^{[1
]}

Takayuki, Yabu ^{[1
]}

Tatsuya, Yanagida ^{[1
]}

Suganuma, Takashi ^{[1
]}

Asayama, Takeshi ^{[1
]}

Someya, Hiroshi ^{[1
]}

Hoshino, Hideo ^{[1
]}

Nakano, Masaki ^{[1
]}

Moriya, Masato ^{[1
]}

Nishisaka, Toshihiro ^{[1
]}

Abe, Tamotsu ^{[1
]}

Sumitani, Akira ^{[1
]}

Nagano, Hitoshi ^{[1
]}

Sasaki, Youichi ^{[1
]}

Nagai, Shinji ^{[1
]}

Watanabe, Yukio ^{[1
]}

Soumagne, Georg ^{[1
]}

Ishihara, Takanobu ^{[1
]}

Wakabayashi, Osamu ^{[1
]}

Kakizaki, Kouji ^{[1
]}

Mizoguchi, Hakaru ^{[1
]}

机构：

[1] EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan

来源：

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES | 2009年 / 7271卷

关键词：

EUV light source; laser produced plasma; CO(2) laser;

D O I：

10.1117/12.813639

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We are developing a CO(2) laser driven Tin plasma EUV source for HVM EUVL. This approach enables cost-effective EUV power scaling by high-conversion efficiency and full recovery of Tin fuel. The RF-excited, multi 10 kW average power pulsed CO(2) laser system is a MOPA (master oscillator power amplifier) configuration and operates at 100 kHz with 20 ns pulse width. The EUV light source is scalable to in-band 200 W IF power with a single 20-kW CO(2) laser beam. EUV chamber is kept uncontaminated by using a small size droplet target and effective Tin exhaust by magnetic plasma guiding. Characterization of the plasma flow in uniform magnetic field was studied by monitoring the motion of Tin plasma stream in a large vacuum chamber, depending on the magnetic flux up to 2 T. Topics relevant for HVM source is reported on continuous operation and Tin vapor evacuation.

引用

页数：7

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