Measurement and Evaluation of Local Surface Temperature Induced by Irradiation of Nanoscaled or Microscaled Electron Beams

被引:13
作者
Wang, Zhenhai [2 ,3 ]
Gui, Lijiang [1 ]
Han, Danhong [2 ,3 ]
Xu, Zhuang [1 ]
Han, Li [1 ]
Xu, Shengyong [2 ,3 ]
机构
[1] Chinese Acad Sci, Inst Elect Engn, Dept Micronano Fabricat Technol, Beijing 100190, Peoples R China
[2] Peking Univ, Key Lab Phys & Chem Nanodevices, Beijing 100871, Peoples R China
[3] Peking Univ, Dept Elect, Beijing 100871, Peoples R China
来源
NANOSCALE RESEARCH LETTERS | 2019年 / 14卷 / 1期
基金
国家重点研发计划;
关键词
Electron beam; Local temperature; Thin film thermocouple; Nanoscale thermometry; Transmission electron microscopy; Scanning electron microscopy; Vaporization; Melting point; Energy converting; MECHANICAL-PROPERTIES; NANOWIRES; BEHAVIOR; FABRICATION; DEFECTS;
D O I
10.1186/s11671-018-2821-x
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Electron beams (e-beams) have been applied as detecting probes and clean energy sources in many applications. In this work, we investigated several approaches for measurement and estimation of the range and distribution of local temperatures on a subject surface under irradiation of nano-microscale e-beams. We showed that a high-intensity e-beam with current density of 10(5-6)A/cm(2) could result in vaporization of solid Si and Au materials in seconds, with a local surface temperature higher than 3000K. With a lower beam intensity to 10(3-4)A/cm(2), e-beams could introduce local surface temperature in the range of 1000-2000K shortly, causing local melting in metallic nanowires and Cr, Pt, and Pd thin films, and phase transition in metallic Mg-B films. We demonstrated that thin film thermocouples on a freestanding Si3N4 window were capable of detecting peaked local surface temperatures up to 2000K and stable, and temperatures in a lower range with a high precision. We discussed the distribution of surface temperatures under e-beams, thermal dissipation of thick substrate, and a small converting ratio from the high kinetic energy of e-beam to the surface heat. The results may offer some clues for novel applications of e-beams.
引用
收藏
页数:11
相关论文
共 49 条
[1]   Step edge cut off - A new fabrication process for metal-based single electron devices [J].
Altmeyer, S ;
Spangenberg, B ;
Kuhnel, F ;
Kurz, H .
MICROELECTRONIC ENGINEERING, 1996, 30 (1-4) :399-402
[2]  
[Anonymous], 1995, PRINCIPLES AND PRACT
[3]   Anisotropic Ti-6Al-4V gyroid scaffolds manufactured by electron beam melting (EBM) for bone implant applications [J].
Ataee, Arash ;
Li, Yuncang ;
Fraser, Darren ;
Song, Guangsheng ;
Wen, Cuie .
MATERIALS & DESIGN, 2018, 137 :345-354
[4]   Improving critical dimension accuracy and throughput by subfield scheduling in electron beam mask writing [J].
Babin, S ;
Kahng, AB ;
Mandoiu, II ;
Muddu, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (06) :3094-3100
[5]   Measurement of resist heating in photomask fabrication [J].
Babin, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06) :2209-2213
[6]   Calculation of the thermal effect of an electron probe on a sample of GaN [J].
Bakaleinikov, LA ;
Galaktionov, EV ;
Tret'yakov, VV ;
Tropp, ÉA .
PHYSICS OF THE SOLID STATE, 2001, 43 (05) :811-817
[7]  
Baloch KH, 2012, NAT NANOTECHNOL, V7, P315, DOI [10.1038/NNANO.2012.39, 10.1038/nnano.2012.39]
[8]   Estimation of the electron beam-induced specimen heating and the emitted X-rays spatial resolution by Kossel microdiffraction in a scanning electron microscope [J].
Bouscaud, Denis ;
Pesci, Raphael ;
Berveiller, Sophie ;
Patoor, Etienne .
ULTRAMICROSCOPY, 2012, 115 :115-119
[9]   Electron thermal microscopy [J].
Brintlinger, Todd ;
Qi, Yi ;
Baloch, Kamal H. ;
Goldhaber-Gordon, David ;
Cumings, John .
NANO LETTERS, 2008, 8 (02) :582-585
[10]   Electron beam welding of a Ti-45Al-2Nb-2Mn+0.8 vol% TiB2 XD alloy [J].
Chaturvedi, MC ;
Richards, NL ;
Xu, Q .
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1997, 240 :605-612