Fatigue-resistant silicon films coated with nanoscale alumina layers

被引：20

作者：

Baumert, E. K. ^{[1
]}

Theillet, P. -O. ^{[1
]}

Pierron, O. N. ^{[1
]}

机构：

[1] Georgia Inst Technol, GW Woodruff Sch Mech Engn, Atlanta, GA 30332 USA

来源：

SCRIPTA MATERIALIA | 2011年 / 65卷 / 07期

基金：

美国国家科学基金会;

关键词：

Fatigue; Thin films; Coatings; Silicon; POLYCRYSTALLINE SILICON; DYNAMIC FATIGUE; MECHANISM; FAILURE;

D O I：

10.1016/j.scriptamat.2011.06.034

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The fatigue properties of monocrystalline Si thin films coated with nanoscale alumina layers (ranging from 4.2 to 50 nm) are compared to those of uncoated Si films, in air at 30 degrees C, 50% relative humidity (RH) and 80 degrees C, 90% RH. The presence of alumina coatings results in more than two orders of magnitude longer fatigue lives, even though subcritical cracking of alumina occurs. The effects of the alumina coating thickness on the overall fatigue degradation behavior are discussed. (C) 2011 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

引用

页码：596 / 599

页数：4

共 18 条

[1] Mechanisms for fatigue of micron-scale silicon structural films [J].

Alsem, Daan Hein ;

Pierron, Olivier N. ;

Stach, Eric A. ;

Muhlstein, Christopher L. ;

Ritchie, Robert O. .

ADVANCED ENGINEERING MATERIALS, 2007, 9 (1-2) :15-30

[2] Fatigue failure in thin-film polycrystalline silicon is due to subcritical cracking within the oxide layer [J].

Alsem, DH ;

Stach, EA ;

Muhlstein, CL ;

Ritchie, RO .

APPLIED PHYSICS LETTERS, 2005, 86 (04) :041914-1

[3] Investigation of the low-cycle fatigue mechanism for micron-scale monocrystalline silicon films [J].

Baumert, E. K. ;

Theillet, P-O ;

Pierron, O. N. .

ACTA MATERIALIA, 2010, 58 (08) :2854-2863

[4] Highly localized surface oxide thickening on polycrystalline silicon thin films during cyclic loading in humid environments [J].

Budnitzki, M. ;

Pierron, O. N. .

ACTA MATERIALIA, 2009, 57 (10) :2944-2955

[5] The influence of nanoscale atomic-layer-deposited alumina coating on the fatigue behavior of polycrystalline silicon thin films [J].

Budnitzki, M. ;

Pierron, O. N. .

APPLIED PHYSICS LETTERS, 2009, 94 (14)

[6]

Freund L., 2003, THIN FILM MAT STRESS, DOI 10.1017/CBO9780511754715

[7] Gas diffusion barriers on polymers using Al2O3 atomic layer deposition -: art. no. 051907 [J].

Groner, MD ;

George, SM ;

McLean, RS ;

Carcia, PF .

APPLIED PHYSICS LETTERS, 2006, 88 (05) :1-3

[8] Atomic layer deposited protective coatings for micro-electromechanical systems [J].

Hoivik, ND ;

Elam, JW ;

Linderman, RJ ;

Bright, VM ;

George, SM ;

Lee, YC .

SENSORS AND ACTUATORS A-PHYSICAL, 2003, 103 (1-2) :100-108

[9] Dynamic fatigue of silicon [J].

Kahn, H ;

Ballarini, R ;

Heuer, AH .

CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE, 2004, 8 (01) :71-76

[10] Thermo-mechanical properties of alumina films created using the atomic layer deposition technique [J].

Miller, David C. ;

Foster, Ross R. ;

Jen, Shih-Hui ;

Bertrand, Jacob A. ;

Cunningham, Shawn J. ;

Morris, Arthur S. ;

Lee, Yung-Cheng ;

George, Steven M. ;

Dunn, Martin L. .

SENSORS AND ACTUATORS A-PHYSICAL, 2010, 164 (1-2) :58-67

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