Multiple scattering causes the low energy-low angle constant wavelength topographical instability of argon ion bombarded silicon surfaces

被引:38
作者
Madi, Charbel S. [1 ]
Aziz, Michael J. [1 ]
机构
[1] Harvard Univ, Sch Engn & Appl Sci, Cambridge, MA 02138 USA
关键词
Sputtering; Nanoscale morphology evolution;
D O I
10.1016/j.apsusc.2011.07.143
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We show that holes and perpendicular mode ripples that are generated at low argon ion beam energies and incidence angles on room temperature silicon targets (C. S. Madi, et al., Phys. Rev. Lett. 101 (2008) 246102; C. S. Madi, et al., J. Phys. Condens. Matter 21 (2009) 224010) are caused by multiple scattering events from the impingement of the primary ion beam on adjacent silicon shields. We show that in a geometry that minimizes these multiple scattering events, only ultra-smooth stable silicon surfaces are for incidence angles <50 degrees from normal. We present a revised topographical phase diagram of 250-1000 eV Ar+ ion bombarded silicon surfaces in the linear regime of surface dynamics in the absence of secondary scattering effects. It is characterized only by a diverging wavelength phase transition from parallel mode ripples to a flat stable surface as the incidence angle falls below about 50 degrees from normal incidence, and a crossover to perpendicular mode ripples as the incidence angle crosses above about 80 degrees. (C) 2011 Elsevier B. V. All rights reserved.
引用
收藏
页码:4112 / 4115
页数:4
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