Electric-Field-Assisted Dip-Pen Nanolithography on Poly(4-vinylpyridine) (P4VP) Thin Films

被引:10
|
作者
Wang, Xiaohua [2 ]
Wang, Xin [1 ]
Fernandez, Rodolfo [2 ]
Ocola, Leonidas [3 ]
Yan, Mingdi [1 ]
La Rosa, Andres [2 ]
机构
[1] Portland State Univ, Dept Chem, Portland, OR 97201 USA
[2] Portland State Univ, Dept Phys, Portland, OR 97201 USA
[3] Argonne Natl Lab, Ctr Nanoscale Mat, Argonne, IL 60439 USA
关键词
cross-linked P4VP thin film; protonation; electric-field-assisted; erasable patterns; dip-pen nanolithography; ATOMIC-FORCE MICROSCOPE; ELECTROSTATIC NANOLITHOGRAPHY; POLYMER; INK; AFM; OLIGONUCLEOTIDES; NANOWIRES; RESONANCE; SURFACES;
D O I
10.1021/am1005964
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Dip-pen nanolithography (DPN) has attracted increased attention for its ability to generate nanometer-scale patterns on solid surface using an "ink"-coated atomic force microscope (AFM) tip. In contrast to this conventional anchoring-molecules procedure, nanopatterns can also be created by triggering the structural response of the proper substrate. In one approach, the delivery of acidic buffer from the tip into a poly(4-vinylpyridine) (P4VP) thin film (while the tip is being laterally moved, in a raster fashion, along a preprogrammed pattern) leads to the polymer swelling in response to the local protonation. This practice, however, has suffered from a lack of consistency due to the potentially many factors influencing the pattern formation. Herein we report that a more reliable strategy for well controlling the protonation process results when applying an electric held between the AFM tip and the sample. We demonstrate the improved capabilities of the electric-field-assisted DPN method towards reproducibly and reliably fabricating nanostructures by taking advantage of the responsive characteristics (i.e. swelling) of P4VP. Our work includes a systematic study of pattern fabrication under different patterning parameters (mainly the applied bias and contact force) and, very important, provides evidence of the reversible characteristic of the pattern formation process.
引用
收藏
页码:2904 / 2909
页数:6
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