Demonstration of low-loss on-chip integrated plasmonic waveguide based on simple fabrication steps on silicon-on-insulator platform

被引：14

作者：

Tobing, Landobasa Y. M. ^{[1
]}

Tjahjana, Liliana ^{[1
]}

Zhang, Dao Hua ^{[1
]}

机构：

[1] Nanyang Technol Univ, Nanophoton Lab, Singapore 639798, Singapore

来源：

APPLIED PHYSICS LETTERS | 2012年 / 101卷 / 04期

基金：

新加坡国家研究基金会;

关键词：

DEVICES;

D O I：

10.1063/1.4739523

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report the experimental realization of a robust silicon-based plasmonic waveguide structure which can theoretically provide sub-wavelength confinement for E-x- and E-y-polarized surface plasmon polariton modes. Our waveguides exhibit propagation loss as low as 0.2 dB/mu m with similar to 50% coupling efficiency. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4739523]

引用

页数：4

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