Two-dimensional ferroelectric channel transistors integrating ultra-fast memory and neural computing

被引:242
作者
Wang, Shuiyuan [1 ]
Liu, Lan [1 ]
Gan, Lurong [1 ]
Chen, Huawei [1 ]
Hou, Xiang [1 ]
Ding, Yi [1 ]
Ma, Shunli [1 ]
Zhang, David Wei [1 ]
Zhou, Peng [1 ]
机构
[1] Fudan Univ, Sch Microelect, ASIC & Syst State Key Lab, Shanghai 200433, Peoples R China
基金
中国国家自然科学基金;
关键词
OXIDE;
D O I
10.1038/s41467-020-20257-2
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
With the advent of the big data era, applications are more data-centric and energy efficiency issues caused by frequent data interactions, due to the physical separation of memory and computing, will become increasingly severe. Emerging technologies have been proposed to perform analog computing with memory to address the dilemma. Ferroelectric memory has become a promising technology due to field-driven fast switching and non-destructive readout, but endurance and miniaturization are limited. Here, we demonstrate the alpha -In2Se3 ferroelectric semiconductor channel device that integrates non-volatile memory and neural computation functions. Remarkable performance includes ultra-fast write speed of 40ns, improved endurance through the internal electric field, flexible adjustment of neural plasticity, ultra-low energy consumption of 234/40 fJ per event for excitation/inhibition, and thermally modulated 94.74% high-precision iris recognition classification simulation. This prototypical demonstration lays the foundation for an integrated memory computing system with high density and energy efficiency. Ferroelectric devices with dielectric layers to modulate channel conductance have limited endurance and miniaturization. Here, the authors demonstrate a 2D ferroelectric channel transistor that integrates memory and computation capabilities, that will support the development of memory and computing fusion systems.
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页数:9
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