Silicon oxy carbide nanorings from polystyrene-b-polydimethylsiloxane diblock copolymer thin films

被引:24
作者
Chao, Chia-Cheng [1 ]
Ho, Rong-Ming [1 ]
Georgopanos, Prokopios [2 ]
Avgeropoulos, Apostolos [2 ]
Thomas, Edwin L. [3 ]
机构
[1] Natl Tsing Hua Univ, Inst Nanoengn & Microsyst, Hsinchu 30013, Taiwan
[2] Univ Ioannina, Dept Mat Sci & Engn, GR-45110 Ioannina, Greece
[3] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
关键词
BLOCK-COPOLYMERS; ARRAYS; LITHOGRAPHY; ORIENTATION; FABRICATION; NANOPORE; SENSOR;
D O I
10.1039/c002165b
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A silicon-containing diblock copolymer, poly(styrene)-b-poly(dimethylsiloxane) (PS-PDMS), with PDMS cylinders in a PS matrix has been synthesized through sequential anionic polymerization. PS-PDMS thin film was prepared by spin coating on silicon wafer. Perpendicular PDMS cylinders in the PS-PDMS thin film can be obtained by solvent annealing. The PS-PDMS thin film was employed as template for the formation of core-shell cylinder thin films through surface reconstruction. By taking advantage of the silicon-containing character, silicon oxy carbide nanopattern can be fabricated due to the crosslinking of PDMS blocks and the degradation of PS blocks through one-step oxygen plasma treatment. As a result, the formation of silicon oxy carbide nanoring arrays can be achieved. This method provides a convenient way to create silicon oxy carbide nanoring arrays from diblock copolymers.
引用
收藏
页码:3582 / 3587
页数:6
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