Electrodeposition of cobalt/silver multilayers from deep eutectic solvent and their giant magnetoresistance

被引：24

作者：

Kumaraguru, S. ^{[1
]}

Pavulraj, R. ^{[1
]}

Vijayakumar, J. ^{[1
]}

Mohan, S. ^{[1
]}

机构：

[1] Cent Electrochem Res Inst, Electroplating & Met Finishing Technol Div, Karaikkudi 630003, Tamil Nadu, India

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2017年 / 693卷

关键词：

Data storage materials; Magnetic films and multilayers; Magnetization; Magnetoresistance; Magnetic measurements; CO-CU/CU MULTILAYERS; AG GRANULAR FILMS; CHOLINE CHLORIDE; ETHYLENE-GLYCOL; IONIC LIQUID; GMR; ELECTROLYTES; ALLOY;

D O I：

10.1016/j.jallcom.2016.10.027

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Cobalt-silver (Co-Ag) deposits were prepared by means of a pulse technique from a deep eutectic solvent containing choline chloride and ethylene glycol. The dissolution of the magnetic layer and incorporation of silver metal in the magnetic layer were optimized using cyclic voltammetry and chronoamperometry. The X-ray diffraction pattern of Co-Ag deposit revealed the formation of polycrystalline structure where cobalt existed in both hcp and fcc phases and silver existed in the fcc phase. Morphological analysis showed the presence of nano grains and exhibited corn-shaped magnetic particles. A maximum giant magnetoresistance (GMR) value of 9.94% was obtained at room temperature. The total magnetoresistance of the Co-Ag deposit was deconvoluted to ferromagnetic (FM) and superparamagnetic (SPM) contributions which showed the presence of large SPM character. (C) 2016 Published by Elsevier B.V.

引用

页码：1143 / 1149

页数：7

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