Laser plasma CVD diamond reactor

被引：7

作者：

Bolshakov, AP

Konov, VI

Prokhorov, AM

Uglov, SA

Dausinger, F

机构：

[1] Russian Acad Sci, Inst Gen Phys, Ctr Nat Sci, Moscow 119991, Russia

[2] Univ Stuttgart, Inst Strahlwerkzeuge, D-70569 Stuttgart, Germany

来源：

关键词：

chemical vapour deposition; diamond films; laser; plasma;

D O I：

10.1016/S0925-9635(01)00408-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The results of multi-parametric investigations of laser plasmatron in application to CVD of diamond are presented. Different reaction chamber configurations were studied. CH4/H-2/Xe(Ar) and CH4/CO2/H-2/Ar gas mixtures at total pressure 1.0-4.5 atm were used. Both convection and directed gas flows with velocity up to 50 cm/s delivered reactants to the substrate surface. Diamond film deposition rates up to 40-50 mum/h were reached. CW CO2 laser beam power and intensity needed for a stationary plasma maintenance under various experimental conditions were found. Laser radiation absorption in plasma was measured. The possibility to combine laser plasma with an auxiliary electrical discharge is demonstrated. A comparison between laser and other plasma CVD techniques is made. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：1559 / 1564

页数：6

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