Analysis of the Excellent Memory Disturb Characteristics of a Hourglass-Shaped Filament in Al2O3/Cu-Based CBRAM Devices

被引:23
作者
Belmonte, Attilio [1 ,2 ]
Celano, Umberto [1 ,2 ]
Redolfi, Augusto [1 ]
Fantini, Andrea [1 ]
Muller, Robert [1 ]
Vandervorst, Wilfried [1 ,2 ]
Houssa, Michel [1 ,2 ]
Jurczak, Malgorzata
Goux, Ludovic [1 ]
机构
[1] IMEC, B-3001 Louvain, Belgium
[2] Katholieke Univ Leuven, Dept Phys & Astron, B-3000 Louvain, Belgium
关键词
Charge-transfer reaction; conductive-atomic-force microscopy (C-AFM); conductive-bridging; conductive-bridging random access memory (CBRAM); constant voltage stress (CVS); ECM; memory disturb; quantum point contact (QPC); read endurance; voltage-time dilemma; NUCLEATION;
D O I
10.1109/TED.2015.2423094
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
All resistive switching memory devices face a critical voltage-time dilemma, as they require fast write at moderate voltage together with disturb immunity at lower (read) voltage. In this paper, excellent voltage-time characteristics are demonstrated on a 90-nm CMOS-friendly W/Al2O3/TiW/Cu conductive-bridging memory cell. The switching voltage was evaluated in the large write pulsewidth range between 10 ns and 10 s, from which a very low slope of similar to 75 mV/decade was extracted. These characteristics allow, on the one hand, a fast switching (10 ns) at <3 V, and, on the other hand, excellent voltage-disturb immunity extrapolated to +/- 0.5 V for 10 years. Both constant-voltage-stress and read-endurance tests supported these predictions. By means of conductive-atomic-force microscopy tomography, the hourglass shape of the Cu filament was evidenced. Both the more distributed electrical field induced by this shape along the filament and the analysis of a charge-transfer (redox) reaction as rate-limiting mechanism in the switching process are discussed as the origins of this excellent disturb immunity.
引用
收藏
页码:2007 / 2013
页数:7
相关论文
共 24 条
[1]  
[Anonymous], 2014, IEDM, DOI DOI 10.1109/IEDM.2014.7047048
[2]   A novel resistance memory with high scalability and nanosecond switching [J].
Aratani, K. ;
Ohba, K. ;
Mizuguchi, T. ;
Yasuda, S. ;
Shiimoto, T. ;
Tsushima, T. ;
Sone, T. ;
Endo, K. ;
Kouchiyama, A. ;
Sasaki, S. ;
Maesaka, A. ;
Yamada, N. ;
Narisawa, H. .
2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2, 2007, :783-786
[3]  
Banno N., 2014, IEEE S VLSI TECHN, P1, DOI DOI 10.1109/VLSIT.2014.6894437
[4]  
Bard A.J., 2001, ELECTROCHEMICAL METH, P87
[5]   Origin of the current discretization in deep reset states of an Al2O3/Cu-based conductive-bridging memory, and impact on state level and variability [J].
Belmonte, A. ;
Degraeve, R. ;
Fantini, A. ;
Kim, W. ;
Houssa, M. ;
Jurczak, M. ;
Goux, L. .
APPLIED PHYSICS LETTERS, 2014, 104 (23)
[6]  
Belmonte A., 2014, P IEEE 6 INT MEM WOR, P1, DOI DOI 10.1109/IMW.2014.6849356
[7]   A Thermally Stable and High-Performance 90-nm Al2O3\Cu-Based 1T1R CBRAM Cell [J].
Belmonte, Attilio ;
Kim, Woosik ;
Chan, Boon Teik ;
Heylen, Nancy ;
Fantini, Andrea ;
Houssa, Michel ;
Jurczak, Malgorzata ;
Goux, Ludovic .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2013, 60 (11) :3690-3695
[8]   Resistance switching of Cu/SiO2 memory cells studied under voltage and current-driven modes [J].
Bernard, Y. ;
Gonon, P. ;
Jousseaume, V. .
APPLIED PHYSICS LETTERS, 2010, 96 (19)
[9]   Three-Dimensional Observation of the Conductive Filament in Nanoscaled Resistive Memory Devices [J].
Celano, Umberto ;
Goux, Ludovic ;
Belmonte, Attilio ;
Opsomer, Karl ;
Franquet, Alexis ;
Schulze, Andreas ;
Detavernier, Christophe ;
Richard, Olivier ;
Bender, Hugo ;
Jurczak, Malgorzata ;
Vandervorst, Wilfried .
NANO LETTERS, 2014, 14 (05) :2401-2406
[10]  
Degraeve R., 2013, 2013 Symposium on VLSI Technology, pT98