Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy

被引：7
|
作者：
Vicente Mendoza, Melquisedec [1 ]
Serrano Perez, Edgar [2 ]
Juarez Lopez, Fernando [1 ]
机构：
[1] Inst Politecn Nacl, CIITEC, Mexico City 02250, DF, Mexico
[2] UNITEC Estado Mexico, Campus Atizapan, Mexico City 52970, DF, Mexico
来源：
MATERIALS LETTERS-X | 2022年 / 15卷
关键词：
MOCVD; Alumina; MCrAlYsuperalloy; LOW-TEMPERATURE; AL2O3;
D O I：
10.1016/j.mlblux.2022.100160
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Alumina deposit was produced by metalorganic chemical vapour deposition process on a NiCoCrAlY superalloy substrate. Low frequency injection in the range 5-10 Hz was used to feed the Aluminium Tri-isopropoxide precursor into a deposit chamber holding at 400 degrees C of temperature. Both scanning electron microscopy and X-ray diffraction analysis were accomplished to characterize the deposited alumina. Topographic images show an alumina deposit roughness of Ra 35 nm measured by atomic force microscopy. An X-photon spectroscopy analysis of the alumina deposit was performed to identify both Al species and chemical analysis. Thermogravimetric analysis was conducted to assess the effect of deposited alumina on the superalloy.
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页数：5
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