Internal structures and shape memory properties of sputter-deposited thin films of a Ti-Ni-Cu alloy

被引:15
作者
Matsunaga, T
Kajiwara, S [1 ]
Ogawa, K
Kikuchi, T
Miyazaki, S
机构
[1] Univ Tsukuba, Inst Sci Mat, Tsukuba, Ibaraki 3058573, Japan
[2] Natl Res Inst Met, Tsukuba, Ibaraki 3050047, Japan
关键词
thin films; shape memory; martensite; microstructure; transmission electron microscopy (TEM);
D O I
10.1016/S1359-6454(01)00110-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Low-temperature heat treatments of the sputter-deposited amorphous films, which were previously proved to be a new method to produce very good shape memory properties for Ti-rich Ti-Ni alloys, have been applied to a ternary Ti-43.0Ni-6.2Cu alloy (at.%). The basically same nanometric structures as in the binary alloy are formed, i.e. the nanometric structures consist of extremely thin plate precipitates of bet structure, which are formed on {100} planes of the parent B2 structure and have the c-axis normal to the habit planes. High-shape recovery stresses of about 500 MPa with recoverable shape strains of 5% are obtained without accompanying any permanent strains. A shape recovery stress of more than 870 MPa is attained if it is allowed to involve about 1% permanent strain. Although these bet precipitates have large tetragonalities, they are perfectly coherent with the parent bcc lattice. The maximum shape recovery stress is nearly twice that of the Ti-rich Ti-Ni binary alloy having a similar nanometric structure. It is suggested that this remarkable increase in recovery stress may be attributed to the change in Burgers vector of dislocations caused by partial disordering in Ti-Ni-Cu alloys. It is emphasized that the shape recovery stress in this ternary alloy is four times that of the Ti,Ni containing samples and 10 times that of a bulk Ti-45Ni-5Cu alloy. (C) 2001 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1921 / 1928
页数:8
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