Effects of a GaN cap layer on the reliability of AlGaN/GaN Schottky diodes

被引:15
作者
Kang, He [1 ]
Wang, Quan [2 ]
Xiao, Hongling [1 ]
Wang, Cuimei [1 ]
Jiang, Lijuan [1 ]
Feng, Chun [1 ]
Chen, Hong [1 ]
Yin, Haibo [1 ]
Qu, Shenqi [1 ]
Peng, Enchao [1 ]
Gong, Jiamin [2 ]
Wang, Xiaoliang [1 ,3 ]
Li, Baiquan [4 ]
Wang, Zhanguo [1 ]
Hou, Xun [3 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
[2] Xian Univ Posts & Telecommun, Sch Elect Engn, Xian, Peoples R China
[3] ISCAS XJTU Joint Lab Funct Mat & Devices Informat, Beijing 100083, Peoples R China
[4] Beijing Huajin Chuangwei Technol Co Ltd, Beijing, Peoples R China
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2015年 / 212卷 / 05期
关键词
AlGaN; GaN; nitride semiconductors; Schottky barriers; Schottky diodes; thin films; ELECTRON-MOBILITY TRANSISTORS; COLLAPSE; VOLTAGE;
D O I
10.1002/pssa.201431719
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, AlGaN/GaN- and GaN/AlGaN/GaN-based Schottky barrier diodes (SBDs) were fabricated and studied for comparison. The recorded electrical characteristics of the devices show that the introduction of a GaN cap layer can evidently reduce the reverse leakage current and suppress the forward current decay of the devices. What is more important, the GaN/AlGaN/GaN-based SBDs are capable of greatly alleviating the unrecoverable degradation of the reverse characteristics, which was observed in the device without a GaN cap layer when the device was under long time reverse dc stress. Detailed analyses were discussed.
引用
收藏
页码:1158 / 1161
页数:4
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