Application of carbonaceous material for fabrication of nano-wires with a scanning electron microscopy

被引:9
作者
Miura, N
Ishii, H
Yamada, A
Konagai, M
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1996年 / 35卷 / 8B期
关键词
electron-beam-induced deposition; contamination; carbon wire; etching mask; n(++)-Si nano-wires; resistance of wires;
D O I
10.1143/JJAP.35.L1089
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electron-beam-induced deposition (EBID) was studied for the fabrication of nanometer scale wire features (nano-wires). Residual hydrocarbon molecules in a scanning electron microscope chamber was used as a precursor and the writing conditions of carbonaceous wires was extensively investigated. A high acceleration voltage and high magnificaiton led to narrower growth of a carbon wire and a wire width of 30 nm was obtained under optimized conditions. For fabrication of conducting nano-wires, the carbon wire and a spin-coated SiO2 were employed as a dry etching mask and a nano-wire of heavily phosphorous-doped Si with a 60 nm width was successfully fabricated. by this novel technique.
引用
收藏
页码:L1089 / L1091
页数:3
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