Dispersive white-light interferometry for thin-film thickness profile measurement

被引：4

作者：

Ghim, YS ^{[1
]}

Kim, SW ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Mech Engn, Taejon 305701, South Korea

来源：

Optical Measurement Systems for Industrial Inspection IV, Pts 1 and 2 | 2005年 / 5856卷

关键词：

interferometer; dispersive white-light interferometry; 3-D surface profile measurement; thin-film thickness profile measurement; polarization;

D O I：

10.1117/12.612076

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We describes a new scheme of dispersive white-light interferometer that is capable of measuring the thickness profile of thin-film layers, for which not only the top surface height profile but also the film thickness of the target surface should be measured at the same time. The interferometer is found useful particularly for in-situ inspection of micro-engineered surfaces such as liquid crystal displays, which requires for high-speed implementation of 3-D surface metrology.

引用

页码：419 / 426

页数：8

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