Study on amorphous silicon thin film by aluminum-induced crystallization

被引:2
|
作者
Li, Minghua [1 ]
Liu, Yong [1 ]
Lin, Yanghuan [1 ]
Guo, Xiaofeng [1 ]
Hong, Ruijiang [1 ]
Shen, Hui [1 ]
机构
[1] Sun Yat Sen Univ, Inst Solar Energy Syst, Guangzhou 510006, Guangdong, Peoples R China
来源
PROCEEDING OF THE FOURTH INTERNATIONAL CONFERENCE ON SURFACE AND INTERFACE SCIENCE AND ENGINEERING | 2011年 / 18卷
关键词
Amorphous silicon thin film; Aluminum-induced crystallization; Interface; Solar cell; LATERAL CRYSTALLIZATION; POLYCRYSTALLINE SILICON; GLASS;
D O I
10.1016/j.phpro.2011.06.061
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
With the rapid development photovoltaic industry, crystallization techniques play an important role in silicon thin film solar cells. In this paper, Amorphous silicon thin film and aluminum films were prepared by electron beam evaporation technique. The films after different annealing crystallization processes were characterized by means of X-ray diffraction, Raman spectra and scanning electron microscopy. We have the emphasis on discussing the influence parameters for the amorphous silicon crystallization quality and growth mechanism. In addition, Al/Si interface was also studied. A layer exchange process occurs between Al layer and Si layer. (C) 2011 Published by Elsevier B. V. Selection and/or peer-review under responsibility of Selection and/or peer-review under responsibility of Lanzhou Institute of Physics, China.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] An experimental study of aluminum-induced crystallization of amorphous silicon thin film in different atmospheres
    National Engineering Research Center for Technology and Equipment of Environmental Deposition, Lanzhou 730070, China
    不详
    不详
    Pan Tao Ti Hsueh Pao, 2008, 8 (1544-1547):
  • [2] Experimental study of aluminum-induced crystallization of amorphous silicon thin films
    Qi, GJ
    Zhang, S
    Tang, TT
    Li, JF
    Sun, XW
    Zeng, XT
    SURFACE & COATINGS TECHNOLOGY, 2005, 198 (1-3): : 300 - 303
  • [3] Aluminum-induced crystallization of amorphous silicon
    Gall, S
    Muske, M
    Sieber, I
    Nast, O
    Fuhs, W
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2002, 299 : 741 - 745
  • [4] Crystallization kinetics of Aluminum-induced amorphous silicon thin films
    Zhang, Li-Yuan
    Duan, Liang-Fei
    Yang, Wen
    Yang, Pei-Zhi
    Deng, Shuang
    Tu, Ye
    Chen, Xiao-Bo
    Rengong Jingti Xuebao/Journal of Synthetic Crystals, 2015, 44 (01): : 85 - 89
  • [5] Study on aluminum-induced crystallization of amorphous silicon thin films at low temperature
    Yang, Sheng
    Xia, Dong-Lin
    Xu, Man
    Zhao, Xiu-Jian
    Wuhan Ligong Daxue Xuebao/Journal of Wuhan University of Technology, 2006, 28 (06): : 7 - 9
  • [6] Aluminum-induced crystallization of PECVD amorphous silicon
    Jenq, K
    Chang, SS
    Lian, YG
    Pan, GZ
    Rahmat-Samii, Y
    AMORPHOUS AND NANOCRYSTALLINE SILICON SCIENCE AND TECHNOLOGY- 2004, 2004, 808 : 303 - 308
  • [7] Silicon nanowires by aluminum-induced crystallization of amorphous silicon
    Zou, M
    Cai, L
    Wang, HY
    Xu, JS
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2006, 9 (02) : G31 - G33
  • [8] Aluminum-induced crystallization of amorphous silicon-germanium thin films
    Gjukic, M
    Buschbeck, M
    Lechner, R
    Stutzmann, M
    APPLIED PHYSICS LETTERS, 2004, 85 (11) : 2134 - 2136
  • [9] Stress effect on aluminum-induced crystallization of sputtered amorphous silicon thin films
    Hsu, CM
    Chen, IF
    Yu, MC
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (08): : 4928 - 4934
  • [10] Stress Effect on Aluminum-Induced Crystallization of Sputtered Amorphous Silicon Thin Films
    Hsu, C.-M. (tedhsu@mail.stut.edu.tw), 1600, Japan Society of Applied Physics (42):