The method of determination of external magnetic field influence on electron beam and electrical circuits in Scanning Electron Microscope

被引:0
|
作者
Pluska, Mariusz [1 ,2 ]
Oskwarek, Lukasz [1 ]
机构
[1] Warsaw Univ Sci & Technol, Inst Elektrotech Teoretycznej & Syst Informacyjno, PL-00661 Warsaw, Poland
[2] Warsaw Univ Sci & Technol, Inst Technol Elekt, PL-00661 Warsaw, Poland
来源
PRZEGLAD ELEKTROTECHNICZNY | 2008年 / 84卷 / 05期
关键词
Scanning Electron Microscopy; electron-microscope image distortions; electromagnetic interference;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electron-microscope image distortion caused by external fields (noises) interaction is one of the most frequent undesirable effects in practical Scanning Electron Microscope (SEM). In the paper some tasks deal with influences of electromagnetic interference (EMI) on the imaging results are presented. The method allowed for determination of the distortions impact on several components of SEM system sources is reviewed in more detail.
引用
收藏
页码:345 / 348
页数:4
相关论文
共 50 条
  • [1] Measurement of Magnetic Field Distorting the Electron Beam Direction in Scanning Electron Microscope
    Pluska, Mariusz
    Oskwarek, Lukasz
    Rak, Remigiusz J.
    Czerwinski, Andrzej
    IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 2009, 58 (01) : 173 - 179
  • [2] MAGNETIC FIELD MEASUREMENTS IN SCANNING ELECTRON MICROSCOPE
    THORNLEY, RF
    HUTCHINS.JD
    APPLIED PHYSICS LETTERS, 1968, 13 (08) : 249 - &
  • [3] MAGNETIC FIELD MEASUREMENTS IN SCANNING ELECTRON MICROSCOPE
    THORNLEY, RF
    HUTCHISON, JD
    IEEE TRANSACTIONS ON MAGNETICS, 1969, MAG5 (03) : 271 - +
  • [4] Influence of the electron beam on electromigration measurements within a scanning electron microscope
    Stahlmecke, B.
    Dumpich, G.
    APPLIED PHYSICS LETTERS, 2007, 90 (04)
  • [5] A METHOD OF MAGNETIC FIELD MEASUREMENT IN A SCANNING ELECTRON MICROSCOPE USING A MICROCANTILEVER MAGNETOMETER
    Orlowska, Karolina
    Mognaschi, Maria E.
    Kwoka, Krzysztof
    Piasecki, Tomasz
    Kunicki, Piotr
    Sierakowski, Andrzej
    Majstrzyk, Wojciech
    Podgorni, Arkadiusz
    Pruchnik, Bartosz
    di Barba, Paolo
    Gotszalk, Teodor
    METROLOGY AND MEASUREMENT SYSTEMS, 2020, 27 (01) : 141 - 149
  • [6] Measurement of the parameters of the electron beam of a scanning electron microscope
    Gavrilenko, V. P.
    Novikov, Yu. A.
    Rakov, A. V.
    Todua, P. A.
    INSTRUMENTATION, METROLOGY, AND STANDARDS FOR NANOMANUFACTURING II, 2008, 7042
  • [7] METHOD FOR MEASURING THE FIELD FROM A MAGNETIC RECORDING HEAD IN THE SCANNING ELECTRON-MICROSCOPE
    WELLS, OC
    JOURNAL OF MICROSCOPY-OXFORD, 1983, 130 (APR): : RP1 - RP2
  • [8] ELECTRON BEAM MACHINING OF SILICON OBSERVED WITH SCANNING ELECTRON MICROSCOPE
    CHANG, THP
    NIXON, WC
    RADIO AND ELECTRONIC ENGINEER, 1966, 31 (05): : 261 - &
  • [9] Electron optics of multi-beam scanning electron microscope
    Mohammadi-Gheidari, A.
    Kruit, P.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2011, 645 (01): : 60 - 67
  • [10] MAGNETIC CONTRAST IN SCANNING ELECTRON MICROSCOPE
    WARDLY, GA
    JOURNAL OF APPLIED PHYSICS, 1971, 42 (01) : 376 - &