The first single source deposition of tin sulfide coatings on glass:: aerosol-assisted chemical vapour deposition using [Sn(SCH2CH2S)2]

被引：115
作者：
Parkin, IP
Price, LS
Hibbert, TG
Molloy, KC
机构：
[1] UCL, Dept Chem, London WC1H 0AJ, England
[2] Univ Bath, Dept Chem, Bath BA2 7AY, Avon, England
来源：
JOURNAL OF MATERIALS CHEMISTRY | 2001年 / 11卷 / 05期
关键词：
Tin thiolate; Thin film; Chemical vapour deposition; Aerosol-assisted chemical vapour deposition; Tin sulfide;
D O I：
10.1039/b009923f
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Aerosol-assisted chemical vapour deposition of SnS has been achieved on glass substrates from the single source precursor [Sn(SCH2CH2S)(2)] at 400-550 degreesC. In the presence of H2S the precursor produces films of SnS2 at 350 degreesC, Sn2S3 at 400 degreesC and SnS at 500 degreesC. The tin sulfides were analysed by Raman (SnS2 312 and 215 cm(-1); Sn2S3 307, 251, 234, 183, 87, 71, 60, 52 and 36 cm(-1) and SnS 288, 220, 189, 163 and 96 cm(-1)), EDAX, SEM and band gap measurements (SnS 1.15 eV, SnS2 2.20 eV). Growth rates were of the order of 15 nm min(-1).
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页码：1486 / 1490
页数：5
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