Compensation mechanism for N acceptors in ZnO

被引:367
作者
Lee, EC [1 ]
Kim, YS [1 ]
Jin, YG [1 ]
Chang, KJ [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
关键词
D O I
10.1103/PhysRevB.64.085120
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a mechanism for the compensation of N acceptors in ZnO through real-space multigrid electronic structure calculations within the local-density-functional approximation. We find that at low N doping levels using a normal N-2 source, O vacancies are the main compensating donors for N acceptors, while N acceptors are compensated via the formation of defect complexes with Zn antisites at high doping levels, When an active plasma N-2 gas is used to increase the N solubility, N acceptors are still greatly compensated by N-2 molecules at oxygen sites and N-acceptor-N-2 complexes, explaining the difficulty in achieving low-resistivity p-type ZnO.
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页数:5
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