Fabrication and characterization of TiO2 antireflection thin film deposited on the solar cell

被引:0
|
作者
Wang Hequan [1 ,2 ]
Ba Dechun [2 ]
Shen Hui [3 ]
Wen Lishi [4 ]
机构
[1] Shenyan Inst Aeronaut Engn, Shenyang 110034, Liaoning, Peoples R China
[2] Northeastern Univ, Shenyang 110004, Liaoning, Peoples R China
[3] Sun Yat Sen Univ, Guangzhou 510275, Guangdong, Peoples R China
[4] Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
暂无
中图分类号
TU [建筑科学];
学科分类号
0813 ;
摘要
TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crystals in the visible and near-infrared wavelength region, high dielectric constant, wide band gap, high wear resistance and stability, etc, for which make it being used in many fields. This paper aims to investigate the antireflection characterization of TiO2 thin film on silicon solar cell. The TiO2 thin films were prepared by DC reactive magnetron sputtering process from Ti target. The reflectivity of the films were measured by UV-3101PC, the index of refraction (n) and extinction coefficient (k) were measured by n&k Analyzer 1200,and the IN characteristic curves of uncoated and coated solar cell were measured by I-V testing system of solar cell.
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页码:1000 / +
页数:2
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