The influence of thickness on the Kondo effect in Cu(Fe) thin films

被引：6
作者：
Apostolopoulos, G
Papastaikoudis, C
机构：
[1] Institute for Material Science, Natl. Ctr. for Sci. Res. Demokritos, Athens, Attiki
来源：
SOLID STATE COMMUNICATIONS | 1996年 / 99卷 / 04期
关键词：
thin films; Kondo effect;
D O I：
10.1016/0038-1098(96)00211-6
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
The resistivity of thin films of the Cu(Fe) system (c = 130 ppm Fe) has been measured as a function of thickness in the temperature ranges between 1.6 and 30 K. The measurements have shown that the slope of the logarithmic temperature dependence decreases with decreasing thickness below 7 mu m. This behavior is attributed to the influence of the film thickness on the conduction electron-spin screening cloud which forms around the magnetic impurities. Copyright (C) 1996 Elsevier Science Ltd
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页码：277 / 281
页数：5
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