A 50-100 GHz ohmic contact SPDT RF MEMS silicon switch with dual axis movement

被引:14
作者
Sim, Sung-min [1 ]
Lee, Yeonsu [1 ]
Jang, Yun-Ho [2 ]
Lee, Yong-Seok [2 ]
Kim, Yong-Kweon [2 ]
Llamas-Garro, Ignacio [3 ]
Kim, Jung-Mu [4 ]
机构
[1] Chonbuk Natl Univ, Sch Elect & Informat Engn, Jeonju 54896, South Korea
[2] Seoul Natl Univ, Dept Elect & Comp Engn, Seoul, South Korea
[3] Ctr Tecnol Telecomunicac Catalunya, Castelldefels 08860, Spain
[4] Chonbuk Natl Univ, Div Elect Engn, Jeonju 54896, South Korea
基金
新加坡国家研究基金会;
关键词
RF MEMS switch; High isolation; Dual axis movement; Silicon switch;
D O I
10.1016/j.mee.2016.05.008
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We firstly show the prototype of an ohmic contact Single-Pole Double Throw Radio Frequency Micro-Electro-Mechanical Systems (SPDT RF MEMS) switch operating at 50-100 GHz. The fabricated ohmic contact SPDT RF MEMS silicon switch moves both laterally and vertically, to improve the isolation at high frequencies by initially misaligning the contact part of the switch over a Coplanar Waveguide (CPW) transmission line. The lateral and vertical movement of the switch is operated by using comb and parallel plate actuators, respectively. The proposed switch was fabricated using Silicon-On-Glass (SiOG) bonding process. The insertion loss of the fabricated switch is measured according to the different operation states of the switch, in the range from 50 to 100 GHz. The fabricated length of the transmission line is 4.6 mm and the measured insertion loss and isolation are 9.13 dB and 24.37 dB at 70 GHz, respectively. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:69 / 74
页数:6
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