Enlargement of SiC single crystal: Enhancement of lateral growth using tapered graphite lid

被引:3
|
作者
Bahng, W
Kitou, Y
Nishizawa, S
Yamaguchi, H
Khan, MN
Oyanagi, N
Arai, K
Nishino, S
机构
[1] UPR Ultra Low Loss Power Device Technol Res Body, R&D Assoc Future Electron Devices, Tsukuba, Ibaraki 3058568, Japan
[2] Electrotech Lab, UPR, Tsukuba, Ibaraki 3058568, Japan
[3] Kyoto Inst Technol, UPR, Sakyo Ku, Kyoto 6068585, Japan
来源
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2 | 2000年 / 338-3卷
关键词
cone-shaped platform; lateral growth; polycrystals; PVT growth; rapid enlargement; single crystal; taper angle;
D O I
10.4028/www.scientific.net/MSF.338-342.103
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
investigated the rapid enlargement of SiC single crystal during physical vapor transport growth by enhancing the lateral growth. The degrees of enlargement of the single crystals grown on the newly developed graphite lid were larger than those of crystals grown on the conventional one. Using a cone-shaped platform, the polycrystals grown around the single crystal could assist the lateral growth of single crystal. There was no significant difference between the central region and the enlarged region as far as the micropipe density was considered. The dependence of the broadening angle (beta) of the single crystal on the taper angle (theta) of the cone-shaped platform was also investigated and an optimum angle at a given growth condition was found.
引用
收藏
页码:103 / 106
页数:4
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