Field Effect Transistors with Current Saturation and Voltage Gain in Ultrathin ReS2

被引:174
作者
Corbett, Chris M. [1 ]
McClellan, Connor [1 ]
Rai, Amritesh [1 ]
Sonde, Sushant Sudam [1 ]
Tutuc, Emanuel [1 ]
Banerjee, Sanjay K. [1 ]
机构
[1] Univ Texas Austin, Dept Elect Engn, Austin, TX 78712 USA
关键词
rhenium disulfide; transistor; TMD; gain; saturation; mobility; CONTACT RESISTANCE; LAYER MOS2; BANDGAP; FETS;
D O I
10.1021/nn505354a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We report the fabrication and device characteristics of exfoliated, few-layer, dual-gated ReS2 field effect transistors (FETs). The ReS2 FETs display n-type behavior with a room temperature I-on/(I)o(ff) of 10 (5). Many devices were studied with a maximum intrinsic mobility of 12 cm2 center dot V1 center dot s1 at room temperature and 26 cm(2) center dot V-1 center dot s(-1) at 77 K. The Cr/Au-ReS2 contact resistance determined using the transfer length method is gate-bias dependent and ranges from 175 k Omega center dot mu m to 5 k Omega center dot mu m, and shows an exponential dependence on back-gate voltage indicating Schottky barriers at the source and drain contacts. Dual-gated ReS2 FETs demonstrate current saturation, voltage gain, and a subthreshold swing of 148 mV/decade.
引用
收藏
页码:363 / 370
页数:8
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