Spectroscopic ellipsometry in the infrared range

被引:30
作者
Drevillon, B [1 ]
机构
[1] Ecole Polytech, Phys Interfaces & Couches Minces Lab, UPR 258 CNRS, F-91128 Palaiseau, France
关键词
spectroscopic ellipsometry; infrared; vibrational properties;
D O I
10.1016/S0040-6090(97)00968-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Various recent applications of infrared ellipsometry (IR-SE) are reviewed with a particular emphasis on in situ studies. It is shown from the characterisation of hydrogen terminated c-Si surfaces that IR-SE can achieve submonolayer sensitivity. As compared to UV-visible SEI the IR range provides vibrational sensitivity. It is shown that a very precise determination of thin film composition can be obtained from the dependence of vibrational properties on the local environment. The capability of probing vibrational properties constitutes a crucial advantage for studies in which chemical information is needed, such as polymer interfaces or surface treatments. From a more fundamental point of view, IR-SE can also probe the local structural order of a thin film material, such as hydrogenated amorphous silicon. As a consequence, IR-SE appears as a promising characterisation technique for surfaces and thin films. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:625 / 630
页数:6
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