Ultrafast dynamics in photoexcited valence-band states of Si studied by time- and angle-resolved photoemission spectroscopy of bulk direct transitions

被引:6
作者
Kanasaki, Jun'ichi [1 ]
Tanimura, Hiroshi [2 ,4 ]
Tanimura, Katsumi [1 ,2 ]
Ries, Philip [3 ]
Heckel, Wolfgang [3 ]
Biedermann, Kerstin [3 ]
Fauster, Thomas [3 ]
机构
[1] Osaka Univ, Inst Sci & Ind Res, Mihogaoka 8-1, Suita, Osaka 5670047, Japan
[2] Osaka Univ, Res Ctr Ultra High Voltage Electron Microscopy, Mihogaoka 7-1, Suita, Osaka 5670047, Japan
[3] Univ Erlangen Nurnberg, Lehrstuhl Festkorperphys, Staudtstr 7, D-91058 Erlangen, Germany
[4] Tohoku Univ, Inst Mat Res, Aoba Ku, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan
关键词
ELECTRONIC-STRUCTURE; QUANTUM KINETICS; QUASI-PARTICLE; PHOTON-ECHOES; SEMICONDUCTORS; THERMALIZATION; TRANSPORT; SILICON; PROBE; GAAS;
D O I
10.1103/PhysRevB.97.035201
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We identify direct-transition photoemission peaks from the bulk valence bands of Si in energy- and momentum-resolved photoemission from Si(111)-(7-7) using polarized 6-eV laser light. Time-resolved study of spectral line shapes of the peaks under interband excitation by 2-eV femtosecond-laser pulses shows the ultrafast transient spectral-width broadening and its recovery associated with a low-energy peak shift. The changes reveal the dynamics of screening effects by electron-hole plasma, hot-hole relaxation, and band renormalization in photoexcited Si, showing strong many-body effects in relaxation at excitation density less than 10(18) cm(-3).
引用
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页数:6
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