Magnetic and transport properties of magnetic wires down to 20 nm in width

被引:16
作者
Ono, T
Ooka, Y
Kasai, S
Miyajima, H
Mibu, K
Shinjo, T
机构
[1] Keio Univ, Fac Sci & Technol, Dept Phys, Yokohama, Kanagawa 2238522, Japan
[2] Kyoto Univ, Inst Chem Res, Uji, Kyoto 6110011, Japan
关键词
ferromagnets-nanoscale; microstructure; domain wall; Anderson localization; magnetoresistance;
D O I
10.1016/S0304-8853(00)00617-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electric resistance measurements down to 20 mK were performed for Ni wires 20 nm in width, 20 nm in thickness and 20 mu-m in length. An increase of resistance proportional to T-1/2 was observed in a wide temperature range from 10 K to 80 mK, which is interpreted by the electron-electron interaction effect. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1831 / 1832
页数:2
相关论文
共 5 条
[1]  
Altshuler B., 1987, SOV SCI REV A, V9, P223
[2]  
Altshuler B. L., 1985, Electron-electron interactions in disordered systems, P1
[3]  
ALTSHULER BL, 1980, PHYS REV B, V22, P5141
[4]   Decoherence and the Thouless crossover is one-dimensional conductors [J].
Khavin, YB ;
Gershenson, ME ;
Bogdanov, AL .
PHYSICAL REVIEW LETTERS, 1998, 81 (05) :1066-1069
[5]   Resistivity due to a domain wall in ferromagnetic metal [J].
Tatara, G ;
Fukuyama, H .
PHYSICAL REVIEW LETTERS, 1997, 78 (19) :3773-3776