Facile routes to patterned surface neutralization layers for block copolymer lithography

被引：151

作者：

Bang, Joona ^{[2
]}

Bae, Joonwon ^{[3
]}

Lowenhielm, Peter ^{[1
]}

Spiessberger, Christian ^{[1
]}

Given-Beck, Susan A. ^{[1
]}

Russell, Thomas P. ^{[3
]}

Hawker, Craig J. ^{[1
]}

机构：

[1] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA

[2] Univ Seoul, Dept Biol & Chem Engn, Seoul 136713, South Korea

[3] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA

来源：

ADVANCED MATERIALS | 2007年 / 19卷 / 24期

关键词：

D O I：

10.1002/adma.200701866

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A new crosslinking system based on azide-functionalized random copolymers has been defined for the preparation of substrates with controllable surface interactions. The azido group is used for both thermal- and photo-crosslinking, which is found to be very efficient. Furthermore, the use of UV irradiation for crosslinking enables the preparation of patterned surfaces by conventional photolithographic techniques, combining the "bottom-up" self-assembly of block copolymer strategies with traditional "top-down" photolithographic methods.

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收藏

页码：4552 / +

页数：7

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