Investigation of Si Dendrites by Electron-Beam-Induced Current

被引:0
|
作者
Yi, Wei [1 ]
Chen, Jun [1 ]
Ito, Shun [2 ]
Nakazato, Koji [1 ]
Kimura, Takashi [1 ]
Sekiguchi, Takashi [1 ,3 ]
Fujiwara, Kozo [2 ]
机构
[1] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan
[2] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
[3] Univ Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058577, Japan
来源
CRYSTALS | 2018年 / 8卷 / 08期
关键词
mc-Si; dendrite; EBIC; grain boundaries; DIRECTIONAL SOLIDIFICATION; GRAIN-BOUNDARIES; SILICON; GROWTH; DEFECTS;
D O I
10.3390/cryst8080317
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
This paper reports on electron-beam-induced current (EBIC) characterization of special multicrystalline Si ingot by dendritic growth under high undercooling. Grain boundaries (GBs), dislocations, and their interaction with carbon related precipitates were investigated. The difference between grains from dendrite and non-dendrite growth was compared. In dendrite grains, parallel twins were frequently found. In non-dendrite grains, irregular GBs of various characters co-existed. Both parallel twins and irregular GBs exhibited dark EBIC contrast at room temperature, indicating the presence of minority carrier recombination centers due to impurity contamination. However, sometimes in non-dendrite grains GBs were visualized with bright EBIC contrast with enhanced collection of charge carriers. The origin of the abnormal bright EBIC contrast was explored and it turned out to be SiC related precipitates, which made GBs conduction channels for electron transport.
引用
收藏
页数:8
相关论文
共 50 条
  • [31] ON THE ORIGIN OF ELECTRON-BEAM-INDUCED-CURRENT CONTRAST OF EXTENDED DEFECTS IN SILICON
    KITTLER, M
    SEIFERT, W
    SCANNING MICROSCOPY, 1992, 6 (04) : 979 - 991
  • [32] Nondestructive analysis of crystal defects in 4H-SiC epilayer by devised electron-beam-induced current method
    Nitani, S
    Hatayama, T
    Yamaguchi, K
    Yano, H
    Uraoka, Y
    Fuyuki, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2005, 44 (37-41): : L1271 - L1274
  • [33] TEMPERATURE-DEPENDENCE OF ELECTRON-BEAM-INDUCED CURRENT IMAGE OF SEMIINSULATING UNDOPED LIQUID-ENCAPSULATED CZOCHRALSKI GAAS
    TOKUMARU, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11A): : 2970 - 2971
  • [34] Observation of leakage sites in high-k gate dielectrics in MOSFET devices by electron-beam-induced current technique
    Sekiguchi, Takashi
    Chen, Jun
    Takase, Masami
    Fukata, Naoki
    Urnezawa, Naoto
    Ohmori, Kenji
    Chikyow, Toyohiro
    Hasunuma, Ryu
    Yamabe, Kikuo
    Inumiya, Seiji
    Nara, Yasuo
    GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY XII, 2008, 131-133 : 449 - +
  • [35] Electron-Beam-Induced Carbon Contamination in STEM-in-SEM: Quantification and Mitigation
    Hugenschmidt, Milena
    Adrion, Katharina
    Marx, Aaron
    Mueller, Erich
    Gerthsen, Dagmar
    MICROSCOPY AND MICROANALYSIS, 2023, 29 (01) : 219 - 234
  • [36] Silicon nanocluster formation under electron-beam-induced modification of a silicate matrix
    Bogomolov, VN
    Gurevich, SA
    Zamoryanskaya, MV
    Sitnikova, AA
    Smirnova, IP
    Sokolov, VI
    PHYSICS OF THE SOLID STATE, 2001, 43 (02) : 373 - 376
  • [37] Substrate effects on the electron-beam-induced deposition of platinum from a liquid precursor
    Donev, Eugenii U.
    Schardein, Gregory
    Wright, John C.
    Hastings, J. Todd
    NANOSCALE, 2011, 3 (07) : 2709 - 2717
  • [38] Silicon nanocluster formation under electron-beam-induced modification of a silicate matrix
    V. N. Bogomolov
    S. A. Gurevich
    M. V. Zamoryanskaya
    A. A. Sitnikova
    I. P. Smirnova
    V. I. Sokolov
    Physics of the Solid State, 2001, 43 : 373 - 376
  • [39] Electron-beam-induced conductivity in self-organized silicon quantum wells
    A. N. Andronov
    S. V. Robozerov
    N. T. Bagraev
    L. E. Klyachkin
    A. M. Malyarenko
    Semiconductors, 1999, 33 : 782 - 787
  • [40] Electron-beam-induced deposition and post-treatment processes to locally generate clean titanium oxide nanostructures on Si(100)
    Schirmer, M.
    Walz, M-M
    Vollnhals, F.
    Lukasczyk, T.
    Sandmann, A.
    Chen, C.
    Steinrueck, H-P
    Marbach, H.
    NANOTECHNOLOGY, 2011, 22 (08)