One-Step Photoembossing for Submicrometer Surface Relief Structures in Liquid Crystal Semiconductors

被引：15
作者：
Liedtke, Alicia [1 ]
Lei, Chunhong [1 ]
O'Neill, Mary [1 ]
Dyer, Peter E. [1 ]
Kitney, Stuart P. [2 ]
Kelly, Stephen M. [2 ]
机构：
[1] Univ Hull, Dept Phys, Kingston Upon Hull HU6 7RX, N Humberside, England
[2] Univ Hull, Dept Chem, Kingston Upon Hull HU6 7RX, N Humberside, England
来源：
ACS NANO | 2010年 / 4卷 / 06期
基金：
英国工程与自然科学研究理事会;
关键词：
molecular electronics; liquid crystals; photonics; nanoimprinting; organic photovoltaics; self-assembly; photolithography; LIGHT-EMITTING-DIODES; POLYMER NETWORKS; GRATINGS; LASERS; FILMS; ELECTROLUMINESCENCE; EMISSION; DEVICE;
D O I：
10.1021/nn100012g
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
We report a new single-step method to directly imprint nanometer-scale structures on photoreactive organic semiconductors. A surface relief grating is spontaneously formed when a light-emitting, liquid crystalline, and semiconducting thin film is irradiated by patterned light generated using a phase mask. Grating formation requires no postannealing nor wet etching so there is potential for high-throughput fabrication. The structured film is cross-linked for robustness. Gratings deeper than the original film thickness are made with periods as small as 265 nm. Grating formation is attributed to mass transfer, enhanced by self-assembly, from dark to illuminated regions. A photovoltaic device incorporating the grating is discussed.
引用
收藏
页码：3248 / 3253
页数：6
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