Lithography-free electrical transport measurements on 2D materials by direct microprobing

被引:6
作者
Gant, Patricia [1 ]
Niu, Yue [1 ,2 ]
Svatek, Simon A. [1 ,3 ,4 ]
Agrait, Nicolas [1 ,3 ,4 ]
Munuera, Carmen [5 ]
Garcia-Hernandez, Mar [5 ]
Frisenda, Riccardo [1 ]
Perez de lara, David [1 ]
Castellanos-Gomez, Andres [5 ]
机构
[1] Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain
[2] Harbin Inst Technol, Natl Key Lab Sci & Technol Adv Composites Special, Harbin, Heilongjiang, Peoples R China
[3] Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
[4] Univ Autonoma Madrid, IFIMAC, E-28049 Madrid, Spain
[5] CSIC, ICMM, E-28049 Madrid, Spain
关键词
FEW-LAYER MOS2; OPTICAL-IDENTIFICATION; HIGH-DETECTIVITY; GRAPHENE; FABRICATION; PHOTOTRANSISTORS; HETEROJUNCTION; PHOTORESPONSE; CHARACTERIZE; ELECTRONICS;
D O I
10.1039/c7tc01203a
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a method to carry out electrical and optoelectronic measurements on 2D materials using carbon fiber microprobes to directly make electrical contacts with the 2D materials without damaging them. The working principle of this microprobing method is illustrated by measuring transport in MoS2 flakes in vertical (transport in the out-of-plane direction) and lateral (transport within the crystal plane) configurations, finding performances comparable to those reported for MoS2 devices fabricated by the conventional lithographic process. We also show that this method can be used with other 2D materials.
引用
收藏
页码:11252 / 11258
页数:7
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