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Lithography-free electrical transport measurements on 2D materials by direct microprobing
被引:6
作者:

Gant, Patricia
论文数: 0 引用数: 0
h-index: 0
机构:
Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain

Niu, Yue
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h-index: 0
机构:
Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain
Harbin Inst Technol, Natl Key Lab Sci & Technol Adv Composites Special, Harbin, Heilongjiang, Peoples R China Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain

Svatek, Simon A.
论文数: 0 引用数: 0
h-index: 0
机构:
Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain
Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
Univ Autonoma Madrid, IFIMAC, E-28049 Madrid, Spain Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain

Agrait, Nicolas
论文数: 0 引用数: 0
h-index: 0
机构:
Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain
Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
Univ Autonoma Madrid, IFIMAC, E-28049 Madrid, Spain Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain

Munuera, Carmen
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h-index: 0
机构:
CSIC, ICMM, E-28049 Madrid, Spain Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain

Garcia-Hernandez, Mar
论文数: 0 引用数: 0
h-index: 0
机构:
CSIC, ICMM, E-28049 Madrid, Spain Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain

Frisenda, Riccardo
论文数: 0 引用数: 0
h-index: 0
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Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain

Perez de lara, David
论文数: 0 引用数: 0
h-index: 0
机构:
Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain

Castellanos-Gomez, Andres
论文数: 0 引用数: 0
h-index: 0
机构:
CSIC, ICMM, E-28049 Madrid, Spain Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain
机构:
[1] Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain
[2] Harbin Inst Technol, Natl Key Lab Sci & Technol Adv Composites Special, Harbin, Heilongjiang, Peoples R China
[3] Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
[4] Univ Autonoma Madrid, IFIMAC, E-28049 Madrid, Spain
[5] CSIC, ICMM, E-28049 Madrid, Spain
关键词:
FEW-LAYER MOS2;
OPTICAL-IDENTIFICATION;
HIGH-DETECTIVITY;
GRAPHENE;
FABRICATION;
PHOTOTRANSISTORS;
HETEROJUNCTION;
PHOTORESPONSE;
CHARACTERIZE;
ELECTRONICS;
D O I:
10.1039/c7tc01203a
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
We present a method to carry out electrical and optoelectronic measurements on 2D materials using carbon fiber microprobes to directly make electrical contacts with the 2D materials without damaging them. The working principle of this microprobing method is illustrated by measuring transport in MoS2 flakes in vertical (transport in the out-of-plane direction) and lateral (transport within the crystal plane) configurations, finding performances comparable to those reported for MoS2 devices fabricated by the conventional lithographic process. We also show that this method can be used with other 2D materials.
引用
收藏
页码:11252 / 11258
页数:7
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