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Enhanced photocatalytic activity and diode performance of ZnO-GO nanocomposites via doping with aluminum
被引:18
|作者:
Hameed, Talaat A.
[1
]
Sharmoukh, Walid
[2
]
Anis, Badawi
[3
]
Youssef, Ahmed M.
[2
]
机构:
[1] Natl Res Ctr, Phys Res Inst, Solid State Phys Dept, 33 ElBohouth St, Giza 12622, Egypt
[2] Natl Res Ctr, Adv Mat Technol & Mineral Resources Res Inst, Inorgan Chem Dept, Giza, Egypt
[3] Natl Res Ctr, Phys Res Inst, Spect Dept, Giza, Egypt
关键词:
zinc oxide-graphene oxide;
aluminum;
Congo red;
diode;
I-V characteristic;
photocatalysis;
DOPED ZINC-OXIDE;
OPTICAL-PROPERTIES;
PHOTOCORROSION INHIBITION;
GRAPHENE;
NANOPARTICLES;
HETEROJUNCTION;
HYBRIDIZATION;
LAYER;
D O I:
10.1002/er.8563
中图分类号:
TE [石油、天然气工业];
TK [能源与动力工程];
学科分类号:
0807 ;
0820 ;
摘要:
Herein, a twofold enhancement tactics were served to boost the photocatalytic activity as well as the diode performance of ZnO. The combination of aluminum (Al) and graphene oxide (GO) with ZnO fostered photocatalytic efficiency on Cong red (CR) and magnified the rectification of The Ag/n-Zn(1-x)AlxO-GO/ p-Si/Al heterostructure diode. Zn1-xAlxO-GO nanocomposites (x = 0.0, 0.03, 0.05, and 0.07 mol, GO = 2 wt.%) were successfully synthesized by solvothermal approach as confirmed by X-ray diffraction (XRD), high-resolution transmission microscope (HRTEM), Fourier transformer infrared (FTIR) and Raman data. The grain size was found to decrease from 38.05 to 68.58 nm when Al was varied from 0.0 to 0.07 mole, as established from the size-strain plot and FESEM micrographs. The data of Raman and FT-IR evidenced the existence of Al in the ZnO matrix. The band gap energies were found to approach the boundary of visible light, as Al reached 0.07 mol. The photocatalysis experiments showed that Zn0.93Al0.07O-GO nanocomposite has a higher removal efficiency. The scavenging investigation proved that the h(+) and OH center dot are major reactive radicals. The recycling test demonstrated (ZnAlO)-Al-0.93-O-0.07-GO nanocomposite showed a high level of reusability. The Ag/n-Zn1-xAlxO-GO/p-Si/Al heterostructure diode was fabricated. The rectification and shunt resistance was boosted, whilst barrier height, ideality factor, and series resistance were decreased with the insertion of Al.
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页码:22601 / 22624
页数:24
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