Discharge in dual magnetron sputtering system

被引：44

作者：

Musil, J ^{[1
]}

Baroch, P ^{[1
]}

机构：

[1] Univ W Bohemia, Dept Phys, Plzen 30614, Czech Republic

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2005年 / 33卷 / 02期

关键词：

dual magnetron; magnetic field confinement; plasma discharge;

D O I：

10.1109/TPS.2005.844996

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Dual magnetron sputtering system represents a very effective tool, particularly for reactive magnetron sputtering of insulated thin films. For efficient deposition process, however, it is very important to optimize electrical and magnetic field of the magnetron. Images of plasma discharges at the different magnetic field configuration of the dual magnetron are presented here.

引用

页码：338 / 339

页数：2