Threshold voltage in Tunnel FETs: physical definition, extraction, scaling and impact on IC design

被引:34
作者
Boucart, Kathy [1 ]
Ionescu, Adrian M. [1 ]
机构
[1] Ecole Polytech Fed Lausanne, Lab Micro & Nanoelect Devices, CH-1015 Lausanne, Switzerland
来源
ESSDERC 2007: PROCEEDINGS OF THE 37TH EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE | 2007年
关键词
D O I
10.1109/ESSDERC.2007.4430937
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This work reports on the physical definition and extraction of threshold voltage in Tunnel FETs based on numerical simulation data. It is shown that the Tunnel FET has the outstanding property of having two threshold voltages: one in terms of gate voltage, V(TG), and one in terms of drain voltage, V(TD). These threshold voltages can be physically defined based on the saturation of the barrier width narrowing with respect to V(G) or V(D). The extractions of V(TG) and V(TD) are performed based on the transconductance change method in the double gate Tunnel FET with a high-k dielectric, and a systematic comparison with the constant current method is reported. The effect of gate length scaling on these threshold voltages, current, conductance characteristics, g(m)/I(D) and g(m)/g(ds) of the Tunnel FET is investigated for the first time.
引用
收藏
页码:299 / 302
页数:4
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