Gap states in the electronic structure of SnO2 single crystals and amorphous SnOx thin films

被引:22
作者
Haeberle, J. [1 ]
Machulik, S. [2 ]
Janowitz, C. [2 ]
Manzke, R. [2 ]
Gaspar, D. [3 ,4 ]
Barquinha, P. [3 ,4 ]
Schmeisser, D. [1 ]
机构
[1] Brandenburg TU Cottbus, Angew Phys Sensor, K Wachsmann Allee 17, D-03046 Cottbus, Germany
[2] Humboldt Univ, Inst Phys, Newtonstr 15, D-12489 Berlin, Germany
[3] Univ Nova Lisboa, Fac Sci & Technol, Dept Mat Sci, Campus Caparica, P-2829516 Caparica, Portugal
[4] CEMOP UNINOVA, Campus Caparica, P-2829516 Caparica, Portugal
关键词
DOPED SNO2; OXIDE; PHOTOEMISSION; SURFACE; SPECTROSCOPY; TRANSPORT; SENSORS; GROWTH; ZNO; TIN;
D O I
10.1063/1.4962313
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electronic structure of a SnO2 single crystal is determined by employing resonant photoelectron spectroscopy. We determine the core level, valence band, and X-ray absorption (XAS) data and compare these with those of amorphous SnOx thin films. We find similar properties concerning the data of the core levels, the valence band features, and the absorption data at the O1s edge. We find strong signals arising from intrinsic in-gap states and discuss their origin in terms of polaronic and charge-transfer defects. We deduce from the XAS data recorded at the Sn3d edge that the Sn4d(10) ground state has contributions of 4d(9) and 4d(8) states due to configuration interaction. We identify localized electronic states depending on the strength of the 4d-5s5p interaction and of the O2p-to-Sn4d charge-transfer processes, both appear separated from the extended band-like states of the conduction band. For the amorphous SnOx thin films, significant differences are found only in the absorption data at the Sn3d-edge due to a stronger localization of the in-gap states. Published by AIP Publishing.
引用
收藏
页数:13
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