Growth of three-dimensional structures by atomic deposition on surfaces containing defects: simulations and theory

被引：35

作者：

Jensen, P ^{[1
]}

Larralde, H

Meunier, M

Pimpinelli, A

机构：

[1] Univ Lyon 1, Dept Phys Mat, F-69622 Villeurbanne, France

[2] Inst Fis, Lab Cuernavaca, Cuernavaca 62251, Morelos, Mexico

[3] Univ Blaise Pascal, LASMEA, F-63177 Aubiere, France

来源：

SURFACE SCIENCE | 1998年 / 412-13卷

关键词：

atomistic dynamics; computer simulations; evaporation and sublimation; models of non-equilibrium phenomena; models of surface kinetics; nucleation;

D O I：

10.1016/S0039-6028(98)00466-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We perform a comprehensive study of the formation of three-dimensional (pyramidal) structures in a large range of conditions, including: the possible evaporation of adatoms from the surface and the presence of surface defects. We compare our computer simulations with theoretical calculations of the growth and find good agreement between them. This work clarifies previous studies of three-dimensional growth and predicts the island size distributions obtained in the different regimes. Finally, we show how our analysis can be used to interpret experimental data. (C) 1998 Elsevier Science B.V. All rights reserved.

引用

页码：458 / 476

页数：19

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