Measurement of sheath expansion in plasma source ion implantation

被引:10
作者
Kim, YW
Kim, GH [1 ]
Han, S
Lee, Y
Cho, J
Rhee, SY
机构
[1] Hanyang Univ, Dept Phys, Ansan, Kyunggi Do, South Korea
[2] Korea Inst Sci & Technol, Adv Anal Ctr, Seoul 130650, South Korea
关键词
plasma source ion implantation; time-dependent sheath; ion wave; Langmuir probe;
D O I
10.1016/S0257-8972(00)01035-5
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In plasma source ion implantation (PSII), the temporal and spatial sheath evolution in terms of the applied negative pulse on a planar target was investigated using a Langmuir probe. Experiments revealed that the dynamic sheath consists of three parts with respect to the phases of the pulse. (i) An ion-matrix sheath expansion scaled with the square root of pulse rise rate and the supersonic velocity during the pulse rise-time. (ii) A sheath expanding with the order of the ion sound speed in the flat-top phase of the pulse. And finally, (iii) sheath shrinking in the fall-time of the pulse. It was also observed that the ion wave was propagated into the plasma after the flat-top phase of the pulse. (C) 2001 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:97 / 101
页数:5
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