Structural and electrical properties of Fe-doped TiO2 thin films

被引：167

作者：

Bally, AR ^{[1
]}

Korobeinikova, EN

Schmid, PE

Levy, F

Bussy, F

机构：

[1] Ecole Polytech Fed Lausanne, Inst Phys Appl, CH-1015 Lausanne, Switzerland

[2] Inst Crystallog, Kaluga 248033, Russia

[3] Univ Lausanne, Inst Mineral, CH-1015 Lausanne, Switzerland

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1998年 / 31卷 / 10期

关键词：

D O I：

10.1088/0022-3727/31/10/004

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The present study discusses the effect of iron doping in TiO2 thin films deposited by rf sputtering. Iron doping induces a structural transformation from anatase to rutile and electrical measurements indicate that iron acts as an acceptor impurity. Thermoelectric power measurement shows a transition between n-type and p-type electrical conduction for an iron concentration around 0.13 at.%. The highest p-type conductivity at room temperature achieved by iron doping was 10(-6) S m(-1).

引用

页码：1149 / 1154

页数：6

共 15 条

[1] TIO2 ACCESSORY MINERALS - COARSENING, AND TRANSFORMATION KINETICS IN PURE AND DOPED SYNTHETIC NANOCRYSTALLINE MATERIALS [J].

BANFIELD, JF ;

BISCHOFF, BL ;

ANDERSON, MA .

CHEMICAL GEOLOGY, 1993, 110 (1-3) :211-231

[2] INVESTIGATIONS OF TIO2 FILMS DEPOSITED BY DIFFERENT TECHNIQUES [J].

BANGE, K ;

OTTERMANN, CR ;

ANDERSON, O ;

JESCHKOWSKI, U ;

LAUBE, M ;

FEILE, R .

THIN SOLID FILMS, 1991, 197 (1-2) :279-285

[3] Temperature effects on the size of anatase crystallites in Mo-TiO2 and W-TiO2 powders [J].

Bregani, F ;

Casale, C ;

Depero, LE ;

NataliSora, I ;

Robba, D ;

Sangaletti, L ;

Toledo, GP .

SENSORS AND ACTUATORS B-CHEMICAL, 1996, 31 (1-2) :25-28

[4] ELECTRICAL-PROPERTIES OF MANGANESE-DOPED TITANIUM-DIOXIDE [J].

FUJITSU, S ;

HAMADA, T .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1994, 77 (12) :3281-3283

[5] Preparation and electrochromism of RF-sputtered TiO2 films [J].

Kitao, M ;

Oshima, Y ;

Urabe, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (7A) :4423-4426

[6] Role of He gas mixture on the growth of anatase and rutile TiO2 films in RF magnetron sputtering [J].

Okimura, K ;

Shibata, A .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (5A) :2849-2855

[7] Ce-doped TiO2 insulators in thin film electroluminescent devices [J].

Prasad, K ;

Bally, AR ;

Schmid, PE ;

Levy, F ;

Benoit, J ;

Barthou, C ;

Benalloul, P .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (9A) :5696-5702

[8]

Radeka M., 1994, SOLID STATE PHENOM, V39, P113, DOI DOI 10.4028/WWW.SCIENTIFIC.NET/SSP.39-40.113

[9]

Sayer M., 1992, Integrated Ferroelectrics, V1, P129, DOI 10.1080/10584589208215570

[10] COMPUTER-SIMULATION STUDY OF THE DEFECT CHEMISTRY OF RUTILE TIO2 [J].

SAYLE, DC ;

CATLOW, CRA ;

PERRIN, MA ;

NORTIER, P .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1995, 56 (06) :799-805

← 1 2 →