Structural and electrical properties of Fe-doped TiO2 thin films

被引:167
作者
Bally, AR [1 ]
Korobeinikova, EN
Schmid, PE
Levy, F
Bussy, F
机构
[1] Ecole Polytech Fed Lausanne, Inst Phys Appl, CH-1015 Lausanne, Switzerland
[2] Inst Crystallog, Kaluga 248033, Russia
[3] Univ Lausanne, Inst Mineral, CH-1015 Lausanne, Switzerland
关键词
D O I
10.1088/0022-3727/31/10/004
中图分类号
O59 [应用物理学];
学科分类号
摘要
The present study discusses the effect of iron doping in TiO2 thin films deposited by rf sputtering. Iron doping induces a structural transformation from anatase to rutile and electrical measurements indicate that iron acts as an acceptor impurity. Thermoelectric power measurement shows a transition between n-type and p-type electrical conduction for an iron concentration around 0.13 at.%. The highest p-type conductivity at room temperature achieved by iron doping was 10(-6) S m(-1).
引用
收藏
页码:1149 / 1154
页数:6
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